Superior tolerance of Ag/Ni multilayers against Kr ion irradiation: an in situ study |
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Authors: | K.Y. Yu C. Sun Y. Chen Y. Liu H. Wang M.A. Kirk |
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Affiliation: | 1. Department of Materials Science and Engineering , Texas A &2. M University , College Station , TX , 77843-3123 , USA;3. M University , College Station , TX , 77843-3123 , USA;4. Department of Electrical and Computer Engineering , Texas A &5. M University , College Station , TX , 77843-3128 , USA;6. Materials Science Division, Argonne National Laboratory , Argonne , IL , 60439 , USA |
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Abstract: | Monolithic Ag and Ni films and Ag/Ni multilayers with individual layer thickness of 5 and 50?nm were subjected to in situ Kr ion irradiation at room temperature to 1 displacement-per-atom (a fluence of 2?×?1014?ions/cm2). Monolithic Ag has high density of small loops (4?nm in diameter), whereas Ni has fewer but much greater loops (exceeding 20?nm). In comparison, dislocation loops, ~4?nm in diameter, were the major defects in the irradiated Ag/Ni 50?nm film, while the loops were barely observed in the Ag/Ni 5?nm film. At 0.2?dpa (0.4?×?1014?ions/cm), defect density in both monolithic Ag and Ni saturated at 1.6 and 0.2?×?1023/m3, compared with 0.8?×?1023/m3 in Ag/Ni 50?nm multilayer at a saturation fluence of ~1?dpa (2?×?1014?ions/cm2). Direct observations of frequent loop absorption by layer interfaces suggest that these interfaces are efficient defect sinks. Ag/Ni 5?nm multilayer showed a superior morphological stability against radiation compared to Ag/Ni 50?nm film. |
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Keywords: | Ag/Ni in situ radiation Kr interface |
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