Structural characteristics and residual stresses in oxide films produced on Ti by pulsed unipolar plasma electrolytic oxidation

Oxide films, 7–10 µm thick, were produced on commercially pure titanium by plasma electrolytic oxidation in a sodium orthophosphate electrolyte using a pulsed unipolar current with frequency (f) and duty cycle (δ) varying within f = 0.1–10 kHz and δ = 0.8–0.2, respectively. The coatings comprised a mixture of an amorphous phase with nanocrystalline anatase and rutile phases, where the relative rutile content range was 17–25 wt%. Incorporation of phosphorus from the electrolyte into the coating in the form of PO₂ ^–, PO₃ ^2– and PO₄ ^3–, as demonstrated by EDX and FT-IR analyses, contributed to the formation of the amorphous phase. Residual stresses associated with the crystalline coating phase constituents were evaluated using the X-ray diffraction sin² ψ method. It was found that, depending on the treatment parameters, internal direct and shear stresses in anatase ranged from–205 (±17) to–431 (±27) MPa and from–98 (±6) to–145 (±10) MPa, respectively, whereas the rutile structure is comparatively stress-free.