| Micro—patterning of Copper Based on Photolithographed Self—assembly Monolayers |
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| 引用本文： | LanHUANG HaoYingSHEN 等. Micro—patterning of Copper Based on Photolithographed Self—assembly Monolayers[J]. 中国化学快报, 2002, 13(2): 163-164 |
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| 作者姓名： | LanHUANG HaoYingSHEN 等 |
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| 作者单位： | [1]NationalLaboratoryofMolecularandBiomolecularElectonics,SoutheastUniversity,Nanjing210096 [2]InstituteofElectronDevices,Nanjing210016 |
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| 基金项目： | This work was supported by the National Natural Science Foundation of the Peoples Republic of China (No. 69890220). |
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| 摘 要： | A new method has been develoed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features. The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.
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| 关 键 词： | 铜 光刻自聚集单层 微观图形 |
Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers |
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| Lan HUANG,Li Na XU,Hao Ying SHEN,Hai Qian ZHANG,Ning GU. Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers[J]. Chinese Chemical Letters, 2002, 13(2): 163-164 |
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| Authors: | Lan HUANG Li Na XU Hao Ying SHEN Hai Qian ZHANG Ning GU |
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| Abstract: | A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features. The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits. |
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| Keywords: | Micro-pattern deposition photolithograph SAMs MPTS SEM. |
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