Low loss niobium oxides film deposited by ion beam sputter deposition |
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Authors: | Lee Cheng-Chung Hsu Jin-Cherng Wong Daw-Heng |
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Institution: | (1) Institute of Optical Sciences, National Central University, Chung-Li, 32054, Taiwan, ROC |
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Abstract: | Thin films of niobium oxides are deposited by ion beam sputtering with a Kaufman-type ion source. The deposition rate is function of the oxygen partial pressure. There is an optimum oxygen pressure at 7 × 10–5 Torr to deposite a stoichiometric film. The as-deposited films are amorphous. The optical parameters, including refractive index, extinction coefficient, and homogeneity, of the oxide films are influenced by post-baking temperature. The surface morphology measured by an atomic force microscope (AFM) shows that there is a certain range of optimum baking temperature which yields a smooth film and a good optical quality. |
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Keywords: | deposition rate homogeneity ion beam sputtering oxygen partial pressure surface roughness |
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