Deposition of silver films by plasma-enhanced chemical vapour deposition |
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| Authors: | C. Oehr H. Suhr |
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| Affiliation: | (1) Department of Organic Chemistry, University, D-7400 Tübingen, Fed. Rep. Germany |
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| Abstract: | Plasma-enhanced chemical vapour deposition of silver films has been performed using perfluoro-1-methylpropenylsilver as a precursor. Under most conditions of rf power, substrate temperature and gas composition shiny films with resistivities of  2   cm and impurities of 1 % are obtained. |
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| Keywords: | 81.15Gh 52.90+z 68.55+b |
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