Deposition of silver films by plasma-enhanced chemical vapour deposition |
| |
Authors: | C. Oehr H. Suhr |
| |
Affiliation: | (1) Department of Organic Chemistry, University, D-7400 Tübingen, Fed. Rep. Germany |
| |
Abstract: | Plasma-enhanced chemical vapour deposition of silver films has been performed using perfluoro-1-methylpropenylsilver as a precursor. Under most conditions of rf power, substrate temperature and gas composition shiny films with resistivities of 2 ![mgr](/content/gu711m3153638241/xxlarge956.gif) cm and impurities of 1 % are obtained. |
| |
Keywords: | 81.15Gh 52.90+z 68.55+b |
本文献已被 SpringerLink 等数据库收录! |
|