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Diffusion study of 18O implanted into α-Hf using the nuclear resonance technique
Authors:F. Bernardi  M. Behar  A. Ruzzarin  J.H.R. dos Santos  F. Dyment
Affiliation:(1) Instituto de Física-UFRGS, Caixa Postal 15051, 91501-970 Porto Alegre, RS, Brasil;(2) Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET), Buenos Aires, Argentina
Abstract:The diffusion of 18O in α-Hf was studied in the 723–923 K temperature range by using ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follows an Arrhenius behavior D(T)=D0e(-Q/RT), where D0=(5±3)×10-9 m2s-1 and Q=162±5 kJ/mol. A comparison of the present results with previous ones is also done. PACS 66:30 Jt; 85:40 Ry
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