Photosensitized decompositions of oxasilacyclopropane ; unusual carbene formation |
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Authors: | Wataru Ando Yoshitaka Hamada Akira Sekiguchi |
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Affiliation: | Department of Chemistry, The University of Tsukuba, Sakura-mura, Niihari-gun, Ibaraki 305, Japan |
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Abstract: | TCNE photo-sensitized decompositions of oxasilacyclopropane (1) generated carbene and silanone, while the DCA sensitized or direct photolysis of (1) gave silylene and indanone. |
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