Inhibition of copper corrosion by self-assembled monolayers of triazole derivative in chloride-containing solution

The self-assembled monolayers (SAMs) derived from 3-undecane-4-amino-5-mercapto-1,2,4-triazole (UAMT) on copper surface have been characterized by contact angle test, X-ray photoelectron spectroscopy, and electrochemical techniques. It is found that the UAMT molecules can spontaneously adsorb to copper surface to form compact and oriented monolayers, which can prevent the corrosion of copper in chloride-containing solution effectively. The electrochemical measurements prove that the adsorption of UAMT molecules on copper surface typically processes with a two-step adsorption consisting of a fast initial adsorption and a slowly following reorganization in 10^?4-M UAMT solution, and the adsorption of UAMT obeys the Langmuir model in the initial adsorption process. Furthermore, the effects of the immersion time, ultrasonic irradiation, and UAMT concentration on the anticorrosion property of SAMs are studied, and the adsorption isotherm of UAMT on copper is followed.