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多孔硅异质结电致发光器件发光特性研究
引用本文:杨亚军,李清山,刘宪云.多孔硅异质结电致发光器件发光特性研究[J].激光技术,2007,31(2):166-168.
作者姓名:杨亚军  李清山  刘宪云
作者单位:1.曲阜师范大学, 物理工程学院, 曲阜, 273165
摘    要:多孔硅电致发光性质的研究对于实现硅基光电集成具有重要的应用价值。采用蒸镀-阳极氧化法制备了多孔硅异质结(ITO/PS/p-Si/Al)电致发光器件,在7.5V较低电压下实现了数小时连续电致发光,并给出了该器件的发光和电学性能的测量结果。结果表明,要制备较好发光性能和伏安特性的多孔硅电致发光器件,顶部电极应同时具有较高的透光率和电导率。

关 键 词:光电子学    电致发光    蒸镀-阳极氧化法    多孔硅
文章编号:1001-3806(2007)02-0166-03
收稿时间:2006-02-20
修稿时间:2006-02-20

Study on properties of electroluminescence from porous silicon heterojunction device
YANG Ya-jun,LI Qing-shan,LIU Xian-yun.Study on properties of electroluminescence from porous silicon heterojunction device[J].Laser Technology,2007,31(2):166-168.
Authors:YANG Ya-jun  LI Qing-shan  LIU Xian-yun
Institution:Department of Physics, Qufu Normal University, Qufu 273165, China
Abstract:Study on electroluminescence from porous silicon(PS) has important application value in silicon-based photoelectron integration.Electrically induced visible light-emitting PS device with structure of ITO/PS/p-Si/Al were fabricated by means of evaporation-anodic oxidation method.The light emission of the device lasted for a few hours under 7.5V forward bias conditions.Luminescent and electronic properties were investigated.Results suggest that ITO thin films should have both high electrical conductivity and optical transmittance in order to achieve light-emitting PS device with fine luminescent and current-voltage properties.
Keywords:optoelectronics  electroluminescence  evaporation-anodic oxidation method  porous silicon
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