Photopatterning of a monomolecular dye film by means of scanning near-field optical microscopy |
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| Authors: | A Naber T Dziomba UC Fischer H-J Maas H Fuchs |
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| Institution: | Physikalisches Institut, Westf?lische Wilhelms-Universit?t, 48149 Münster, Germany (Fax: +49-251/833-3602), DE
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| Abstract: | Patterned bleaching of a photolabile monomolecular dye film by means of scanning near-field optical microscopy (SNOM) is demonstrated. After exposure, the written patterns were verified by SNOM with fluorescence detection. The adsorption of appropriate material to such near-field optically created patterns seems now feasible. The ultimate resolution limit of a monomolecular dye film for patterned bleaching by SNOM is discussed on the basis of a simple model. |
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