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Normal tracing deflectometry using a secondary light source
Authors:Chuanqian Peng  Yumei He  Jie Wang
Institution:1. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, 2019 Jia Luo Road, Jiading District, Shanghai201800, People's Republic of China;2. University of Chinese Academy of Sciences, Beijing100049, People's Republic of China;3. Chongqing University of Technology, 69 Hongguang Avenue, Banan District, Chongqing400054, People's Republic of China
Abstract:Scanning deflectometric profilers based on an f–gθ system are typical optical tools used to measure mirror profiles at many synchrotron facilities. Unlike these profilers, which are based on a pencil beam, here a secondary light source and a pinhole are used to construct a system that automatically selects a beam that will always pass through the pinhole and propagate along the normal direction of the measured area on the surface under test. By measuring the angle variation of the selected beam, slope variations of the surface under test can be measured. Systematic errors introduced by manufacturing defects or aberrations of an optical element, which greatly degrade the performance of traditional profilers, could be minimized by using the developed method. Simulation values of the proposed method and a conventional method are compared.
Keywords:normal tracing method  secondary light source  deflectometric profiler  beam lateral motion  aberration  inhomogeneity
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