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Temperature‐dependent thermal properties of Ru/C multilayers
Authors:Shuai Yan  Hui Jiang  Hua Wang  Yan He  Aiguo Li  Yi Zheng  Zhaohui Dong  Naxi Tian
Affiliation:Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai201204, People's Republic of China
Abstract:Multilayers made of Ru/C are the most promising candidates when working in the energy region 8–20 keV. The stability of its thermal properties, including thermal expansion and thermal conduction, needs to be considered for monochromator or focusing components. Ru/C multilayers with periodic thicknesses of 3, 4 and 5 nm were investigated in situ by grazing‐incidence X‐ray reflectometry and diffuse scattering in order to study their thermal expansion characteristics as a function of annealing temperature up to 400°C. The thermal conductivity of multilayers with the same structure was also measured by the transient hot‐wire method and compared with bulk values.
Keywords:multilayer  X‐ray  interface  thermal conductivity
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