Temperature‐dependent thermal properties of Ru/C multilayers |
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Authors: | Shuai Yan Hui Jiang Hua Wang Yan He Aiguo Li Yi Zheng Zhaohui Dong Naxi Tian |
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Affiliation: | Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai201204, People's Republic of China |
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Abstract: | Multilayers made of Ru/C are the most promising candidates when working in the energy region 8–20 keV. The stability of its thermal properties, including thermal expansion and thermal conduction, needs to be considered for monochromator or focusing components. Ru/C multilayers with periodic thicknesses of 3, 4 and 5 nm were investigated in situ by grazing‐incidence X‐ray reflectometry and diffuse scattering in order to study their thermal expansion characteristics as a function of annealing temperature up to 400°C. The thermal conductivity of multilayers with the same structure was also measured by the transient hot‐wire method and compared with bulk values. |
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Keywords: | multilayer X‐ray interface thermal conductivity |
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