| 正性光致抗蚀剂的合成与应用 |
| |
| 引用本文： | 付川.正性光致抗蚀剂的合成与应用[J].重庆三峡学院学报,2001,17(2):93-94. |
| |
| 作者姓名： | 付川 |
| |
| 作者单位： | 重庆三峡学院化工生物系,重庆,万州,404000 |
| |
| 摘 要： | 正性光致抗蚀剂，能在短时间的光照下分解为可溶性物质，被广泛应用于光刻工艺，是一类新型的电子信患化学品，现介绍正性光致抗蚀剂性的合成原理及施工应用方法．
|
| 关 键 词： | 正性光致抗蚀剂 光刻工艺 邻叠氮醌化合物 |
| 文章编号： | 1008-4347(2001)02-0093-02 |
| 修稿时间： | 2000年5月20日 |
Synthesis And Application of Ortho-photororesist |
| |
| FU Chuan.Synthesis And Application of Ortho-photororesist[J].JOurnal of Chongqing Three Gorges University,2001,17(2):93-94. |
| |
| Authors: | FU Chuan |
| |
| Abstract: | Ortho-photororesist can photoactivate soluble substance in a short time, it is widely used in photosculpture, it is also a new type of electronical information chemicals. This paper will introduce the principle of synthesis and the method of application of ortho-photororesist. |
| |
| Keywords: | ortho-photororesist photosculpture (o)-nitrine quinone compound |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
