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对传统程序控制脉冲电镀电源的设计改进
引用本文:尹电礼,葛长虹.对传统程序控制脉冲电镀电源的设计改进[J].电子工艺技术,2006,27(1):57-59.
作者姓名:尹电礼  葛长虹
作者单位:中国电子科技集团公司第40研究所,安徽,蚌埠,233010;中国电子科技集团公司第40研究所,安徽,蚌埠,233010
摘    要:国产脉冲电镀电源采用手动调节参数,因此在设定好上述参数之后,只能实现单一参数的脉冲波形进行电镀;某些国外电镀电源虽然也实现了程控,但也存在一定的缺陷,如脉宽调节范围较窄,脉冲频率不可调等.我们针对上述缺陷,对传统脉冲电源进行了改造、优化设计.新设计的程序控制脉冲电镀电源以脉冲技术和斩波技术为主要手段,以大功率半导体器件为主开关器件,通过PIC单片机输出各种频率脉冲信号进行控制,来实现各种工艺要求的电镀.

关 键 词:脉冲技术  斩波技术  PIC单片机  电镀电源
文章编号:1001-3474(2006)01-0057-03
收稿时间:2005-11-25
修稿时间:2005年11月25

Optimal Design of Traditional Program-controlled Power Supply Unit for Impulse Electroplating
YIN Dian-li,GE Chang-hong.Optimal Design of Traditional Program-controlled Power Supply Unit for Impulse Electroplating[J].Electronics Process Technology,2006,27(1):57-59.
Authors:YIN Dian-li  GE Chang-hong
Institution:CETC No. 40 Research Institute, Benbu 233010, China
Abstract:By manually adjusting parameters,our national power supply units for impulse electroplating can only implement impulse wave form based on single parameter for electroplating.And some foreign power supply units for electroplating also have certain disadvantages,such as limited adjustable range of impulse width,and non-adjustable impulse frequency.Aiming to these shortcomings,we have performed improvement and optimal design for traditional impulse power supply unit.Our new designed program-controlled power supply unit for impulse electroplating can perform plating,required by different processes,by utilizing impulse and chopping wave techniques as main efforts,and high power semiconductors as main switching devices,and by controlling out impulse signals at different frequencies through PIC.Our unit has achieved significant results in practice,with good responds from users.
Keywords:Impulse technique  Chopping wave technique  PIC  Power supply unit for electroplating  
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