Molecular effect of Al K α X-ray yields from aluminum oxide films for H+ and H+2 ion bombardments |
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| Authors: | A Ootuka F Fujimoto K Komaki K Kawatsura K Ozawa M Terasawa |
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| Institution: | College of General Education, University of Tokyo, Komaba, Meguro-ku, Tokyo 153, Japan;Japan Atomic Energy Research Institute, Tokai, Ibaraki 319-11, Japan;Toshiba Nuclear Engineering Laboratory, Kawasaki, Kanagawa 210, Japan |
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| Abstract: | Al Kα X-ray spectra for equi-velocity H+ and H+2 ions of ? 0.9 MeV/amu incident on thin aluminum oxide films with thickness 100 and 300 Å were observed. The intensity ratio of the KL1 satellite line to the KL0 main one for H+2 incident on the films of thickness 100 and 300 Å was about 10% and 4% larger than that for incident H+, respectively. |
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