低温单色器硅晶体界面接触热阻的实验研究

随着同步辐射装置的发展,同步辐射光源亮度不断地提高,其会对单色器硅晶体产生巨大的热负荷。若不及时有效地释放这些热负载,会导致晶体局部变形,从而影响光的传输效率。接触热阻是影响硅晶体散热能力的重要因素,因此设计和搭建了固体界面接触热阻的实验测量平台,测量不同填充材料及压力对接触热阻的影响。该研究不仅完善了硅晶体与无氧铜接触热阻在低温真空环境下的实验数据,也为晶体单色器的理论分析和冷却结构设计提供了可靠的参数保证。

Experimental study on the thermal contact resistance for monochromators with cryogenic-cooled silicon crystals

With the development of synchrotron radiation device, the brightness of synchrotron radiation light source is improved gradually. As a result, there will be enormous heat load on the monochromator silicon crystals. If the thermal load is not released effectively and timely, the surface shape of crystal will be changed, then the efficiency of light transmission will be decreased dramatically. Thermal contact resistance(TCR) is an important factor that affects heat dissipation capability of crystals. An experimental device was designed and established to study the effect of the filling materials and pressure on TCR. This research not only complemented the experiment data for TCR between the silicon crystals and oxygen free copper in the vacuum cryogenic environment, and provided reliable input parameters for theoretical analysis and cooling structure design of the crystal as well.