跳动模式对微球CH涂层表面粗糙度的影响

 采用低压等离子体化学气相沉积方法（LPPCVD），结合反弹盘系统制备了微球CH涂层，研究了跳动模式对微球CH涂层表面形貌的影响。利用光学显微镜和扫描电镜(SEM)对微球涂层表面形貌进行了分析；利用原子力显微镜（AFM）测定了微球CH涂层表面均方根粗糙度（RMS）并对球形度进行了表征；利用X光照相技术对同心度进行了表征。结果表明：采用间歇跳动模式可有效改善微球CH涂层的表面形貌，降低中高模数的粗糙度。在间歇跳动模式下，减小占空比，可使CH涂层的表面粗糙度得到进一步降低。在占空比为1/4的间歇跳动模式下制备的厚度为30 mm的CH涂层，其表面均方根粗糙度低于30 nm，碳氢-聚苯乙烯（CH-PS）微球的球形度与同心度均优于99%。

Influence of bounce mode on surface roughness of CH coating on microshells

The CH coating on microshells was fabricated by low-pressure plasma chemical vapor deposition (LPPCVD) with a bounce pan system. The influence of bounce modes on the surface topography of the CH coating was discussed. The surface topography was probed by optical microscopy and scanning electron microscopy(SEM). Roughness and sphericity were measured with an atomic force microscopy(AFM). X-radiography was used to obtain the concentricity. The results show that the surface topography of the coating is improved significantly by the intermittent bounce mode, and the roughness of medium high mode is reduced. The surface finish is improved ulteriorly by the intermittent bounce mode as the duty ratio is reduced. The RMS roughness of 30 mm CH coating is less than 30 nm. The spericity and concentri