Super-resolution scanning laser microscopy with a third-order optical nonlinear thin film |
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Authors: | J Wei M Xiao |
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Institution: | (1) Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, 201800, P.R. China;(2) Centro de Ciencias de la Materia Condensada, Universidad Nacional Autónoma de México, Apartado Postal 2681, CP 22800 Ensenada Baja California, Mexico |
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Abstract: | In a configuration of optical far-field scanning microscopy, super-resolution achieved by inserting a third-order optical
nonlinear thin film is demonstrated and analyzed in terms of the frequency response function. Without the thin film the microscopy
is diffraction limited; thus, subwavelength features cannot be resolved. With the nonlinear thin film inserted, the resolution
is dramatically improved and thus the microscopy resolves features significantly smaller than the smallest spacing allowed
by the diffraction limit. A theoretical model is established and the device is analyzed for the frequency response function.
The results show that the frequency response function exceeds the cutoff spatial frequency of the microscopy defined by the
laser wavelength and the numerical aperture of the convergent lens. The main contribution to the improvement of the cutoff
spatial frequency is from the phase change induced by the complex transmission of the nonlinear thin film. Experimental results
are presented and are shown to be consistent with the results of theoretical simulations.
PACS 42.25.Bs; 42.50.St; 42.65.Hw; 42.65.Jx |
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Keywords: | |
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