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| 沉积温度对电沉积PbS薄膜结构和性能的影响 | |
| 引用本文： | 韩文,曹丽云,黄剑锋,王吉富.沉积温度对电沉积PbS薄膜结构和性能的影响[J].人工晶体学报,2009,38(4). |
| 作者姓名： | 韩文 曹丽云 黄剑锋 王吉富 |
| 作者单位： | 1. 陕西科技大学化学与化工学院,西安,710021;陕西科技大学教育部轻化工助剂化学与技术重点实验室,西安,710021 2. 陕西科技大学教育部轻化工助剂化学与技术重点实验室,西安,710021 3. 西安通讯学院,西安,710106 |
| 基金项目： | 教育部新世纪优秀人才支持计划 |
| 摘 要： | 采用电沉积法在ITO导电玻璃表面沉积了PbS薄膜,并用X射线衍射仪(XRD)、原子力显微镜(AFM)以及傅立叶变换红外光谱仪(FT-IR)对薄膜的结构和光学性能进行了表征,研究了沉积温度对薄膜的相组成、显微形貌以及光学性质的影响.结果表明:在U=3 V,pH=2.5,T=60 ℃,沉积时间为20 min,加入EDTA作络合剂的情况下,可制备出沿(111)和(200)晶面取向生长的立方相PbS薄膜.薄膜显微结构均匀而致密,随着反应温度从20 ℃增加到60 ℃,薄膜内的压应力逐渐减小,禁带宽度也随着变小.所制备的微晶PbS薄膜的禁带宽度约为0.39 eV. |
| 关 键 词： | PbS薄膜 电沉积 沉积温度 光学性能 |
Influence of Deposition Temperature on the Structure and Properties of PbS Thin Films Prepared by Electrodeposition |
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| HAN Wen,CAO Li-yun,HUANG Jian-feng,WANG Ji-fu.Influence of Deposition Temperature on the Structure and Properties of PbS Thin Films Prepared by Electrodeposition[J].Journal of Synthetic Crystals,2009,38(4). | |
| Authors: | HAN Wen CAO Li-yun HUANG Jian-feng WANG Ji-fu |
| Institution: | 1.College of Chemistry and Chemical Engineering;Shaanxi University of Science and Technology;Xi'an 710021;China;2.Key Laboratory of Auxiliary Chemistry & Technology for Light Chemical Industry;Ministry of Education;Shaanxi University of Science & Technology;3.Xi'an Communication Institute;Xi'an 710106;China |
| Abstract: | PbS thin films were prepared on ITO substrates using eletrodeposition method.The optical properties and structure of the thin films were characterized by X-ray diffraction(XRD),atomic force microscopy(AFM) and fourier transform infrared spectrometer(FT-IR).The influences of deposition temperature on the phase compositions,surface morphologies and optical properties of the films were investigated.The results show that cubic PbS thin films with oriented growth along(111) and(200) direction can be obtained at ... |
| Keywords: | PbS thin films electrodeposition deposition temperature optical properties |
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