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Acid-base and redox properties of the TiO2/SiO2 surface |
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| Authors: | V. M. Ogenko A. V. Fesenko N. D. Konovalova V. I. Stepanenko |
| Affiliation: | (1) Institute of Surface Chemistry, 252650 Kiev, Ukraine |
| Abstract: | Acid-base and redox properties of TiO2/SiO2 surface go through a minimum as a function of temperature. Practical applications of this phenomenon are discussed. |
| Keywords: | |
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