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Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range |
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| Authors: | Moyan Tan Haochuan Li Qiushi Huang Hongjun Zhou Tonglin Huo Xiaoqiang Wang Jingtao Zhu Shanghai Key Laboratory of Special Artificial Microstructure Materials Technology |
| Affiliation: | Moyan Tan 1,Haochuan Li 1,Qiushi Huang 1,Hongjun Zhou 2,Tonglin Huo 2,Xiaoqiang Wang 1,and Jingtao Zhu 1 1Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Institute of Precision Optical Engineering,Physics Department,Tongji University,Shanghai 200092,China 2National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,China |
| Abstract: | Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5–28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5–28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements. |
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