The study of damage and optical properties in LiNbO3 implanted by MeV Er and He ions |
| |
Authors: | Ke-Ming Wang Bo-Rong Shi Fei Lu Ming-Qi Meng Xiang-Dong Liu Hui Hu |
| |
Affiliation: | Department of Physics , Shandong University , Jinan, 250100, Shandong, China |
| |
Abstract: | Abstract Two LiNbO3 (X and Y cut) crystals from different companies were implanted by 3.0 MeV Er ions to a dose of 7.5 × 1014 ions/cm2 and 3.5 × 1014 ions/cm2 with different beam current densities, respectively. After annealing at 1060°C in air for 2 hours, one LiNbO3 sample was implanted by 1.5 MeV He ions to a dose of 1.5 × 1016 ions/cm2. The Rutherford backscattering/channeling and prism coupling method have been used to study the damage and optical properties in implanted LiNbO3. The results show: (1) the damage in LiNbO3 created by 3.0 MeV Er ions depends strongly on the beam current density; (2) after annealing at 1060°C in air for 2 hours, a good Er doped LiNbO3 crystal was obtained; (3) there is waveguide formation possible in this Er-doped annealed LiNbO3 after 1.5 MeV He ion implantation. It is suggested that annealing is needed to remove the damage created by MeV Er ions before the MeV He ion implantation takes place, to realize the waveguide laser for Er doped LiNbO3. |
| |
Keywords: | Er and He ion implantation Damage profile Optical waveguide |
|
|