Effect of 100 keV N+ ion irradiation on the organic single crystal of hippuric acid for nonlinear optical applications

The potential organic nonlinear optical material of hippuric acid (HA) single crystal has been grown by the slow evaporation solution growth technique using N, N-dimethylformamide as the solvent. Single crystals of pure HA were irradiated at room temperature with 100 keV Nitrogen (N⁺) ions at fluence 1×10¹⁶ and 5×10¹⁶ ions/cm². The pure and irradiated HA single crystals were characterized by different characterization technique. The photoluminescence and UV–visible absorption were performed at room temperature. The crystalline perfection of the pure and irradiated single crystals has been examined by high-resolution X-ray diffraction. Vickers microhardness technique was used to study the effect on the mechanical strength of the crystal at different ion fluences. The structural changes were analyzed by powder X-ray diffraction analysis. The functional groups of the synthesized compound have been identified by Fourier transform infrared spectroscopy. The dielectric constant and dielectric loss as a function of frequency were analyzed at room temperature.