Dynamics of a pulsed laser generated tin plasma expanding in an oxygen atmosphere |
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| Authors: | F Barreca E Fazio F Neri E Barletta S Trusso B Fazio |
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| Institution: | 1. Dipartimento di Fisica della Materia Tecnologie Fisiche Avanzate , Università di Messina , Salita Sperone 31, I-98166, Messina, Italy fgb@ortica.unime.it;3. Dipartimento di Fisica della Materia Tecnologie Fisiche Avanzate , Università di Messina , Salita Sperone 31, I-98166, Messina, Italy;4. Institutfur Physikalische und Theoretische Chemie , Universitat Bonn , Wegelerstr. 12, D-53115, Bonn, Germany;5. CNR-Istituto per i Processi Chimico-Fisici , Via La Farina 237, I-98123, Messina, Italy |
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| Abstract: | Semiconducting tin oxide can be successfully deposited by means of the laser ablation technique. In particular by ablating metallic tin in a controlled oxygen atmosphere, thin films of SnO x have been deposited. The partial oxygen pressure at which the films are deposited strongly influences both the stoichiometry and the structural properties of the films. In this work, we present a study of the expansion dynamics of the plasma generated by ablating a tin target by means of a pulsed laser using time and space resolved optical emission spectroscopy and fast photography imaging of the expanding plasma. Both Sn I and Sn II optical emission lines have been observed from the time-integrated spectroscopy. Time resolved-measurements revealed the dynamics of the expanding plasma in the ambient oxygen atmosphere. Stoichiometry of the films has been determined by means of X-ray photoelectron spectroscopy and correlated to the expansion dynamics of the plasma. |
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| Keywords: | Laser-generated plasma SnO x films Laser ablation |
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