Disordering and annealing of a Si surface under low-energy Si bombardment |
| |
Authors: | Hartmut Hensel Herbert M. Urbassek |
| |
Affiliation: | Fachbereich Physik , Universit?t Kaiserslautern Erwin-Schr?dinger-Straβe , D-67663, Kaiserslautern, Germany |
| |
Abstract: | Abstract We simulated the bombardment of Si(100)(2 × 1) by Si atoms using molecular dynamics. The kinetic energies of the projectiles were 100 and 50 eV. To model the Si–Si-interactions the empirical potential of Stillinger and Weber with the two body part of the potential splined to the universal potential was used. A geometric criterion based on the Lindemann radius was defined to study damage in the Si target. We observed clusters of disordered Si atoms in the target induced by the bombardment. Large clusters of about 50 atoms are formed in the beginning of the bombardment; they shrink and decay into smaller clusters until and equilibrium cluster size of about 10 atoms is reached. Upon annealing at elevated temperature the disordered zones dissolve into point defects. |
| |
Keywords: | Amorphization Ion-induced defects Defect annealing PACS: 61.80.-x, 61.80.Az, 61.82.Fk, 79.20.Rf |
|
|