Anisotropic angular distribution of sputtered atoms |
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Authors: | Zhu Lin Zhang Lai Zhang |
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Affiliation: | 1. Department of Mathematics and Physics , Anhui University of Science and Technology , Huainan, China hnzhangbch@mail.ahbbptt.net.cn;3. Department of Computer Science and Technology , Anhui University of Science and Technology , Huainan, China |
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Abstract: | The sputtering yield angular distributions have been calculated on the basis of the ion energy dependence of total sputtering yields for Ni and Mo targets bombarded by low-energy Hg+ ions. The calculated curves show excellent agreement with the corresponding Wehner's experimental results of sputtering yield angular distributions. This fact clearly demonstrates the intrinsic relation between the ion energy dependence of total sputtering yields and the sputtering yield angular distribution. This intrinsic relation had been ignored in Yamamura's papers [Yamamura, Y. (1982). Theory of sputtering and comparison to experimental data, Nucl. Instr. and Meth., 194, 515–522; Yamamura, Y. (1981). Contribution of anisotropic velocity distribution of recoil atoms to sputtering yields and angular distributions of sputtered atoms, Rad. Eff., 55, 49–55.] due to some obvious mistakes. |
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Keywords: | Total sputtering yield Sputtering yield angular distribution Anisotropic sputtering effect |
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