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Influence of thickness,width and temperature on critical current density of Nb thin film structures |
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| Authors: | K Il’in D Rall M Siegel A Engel A Schilling A Semenov H-W Huebers |
| Institution: | 1. Institute for Micro- and Nano-Electronic Systems, Karlsruhe Institute of Technology, Hertzstrasse 16, 76187 Karlsruhe, Germany;2. Light Technology Institute, Karlsruhe Institute of Technology, Engesserstrasse 13, 76131 Karlsruhe, Germany;3. Physics Institute, University of Zurich, Winterthurerstrasse 190, 8057 Zurich, Switzerland;4. DLR e.V. Institute of Planetary Research, Rutherfordstrasse 2, 12489 Berlin-Adlershof, Germany |
| Abstract: | The density of critical currents jC in Nb thin films with thickness smaller than 15 nm and width between 100 nm and 10 μm has been measured in a wide temperature range. We have found that the temperature dependencies of jC in sub-micrometer wide bridges at 0.7TC < T < TC are well described by the Ginzburg–Landau de-pairing critical current. In wider bridges already at T < 0.9TC the jC value is significantly reduced due to the penetration and de-pinning of magnetic vortices. |
| Keywords: | Thin Nb films De-pairing critical current density De-pinning of magnetic vortices |
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