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Hetero-epitaxial growth of the cubic single crystalline HfO2 film as high k materials by pulsed laser ablation |
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| Authors: | Xinqiang Zhang Hailing TuXiaona Wang Yuhua XiongMengmeng Yang Lei WangJun Du |
| Institution: | Advanced Electronic Materials Institute, General Research Institute for Nonferrous Metals, Beijing 100088, People’s Republic of China |
| Abstract: | |
| Keywords: | A1 Crystal structure A1 Reflection high-energy electron diffraction A3 Laser epitaxy B2 Dielectric materials |
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