Titanium vanadium nitride electrode for micro-supercapacitors |
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| Institution: | 1. Institut National de la Recherche Scientifique (INRS), 1650 Boulevard Lionel- Boulet, Varennes, QC, J3X 1P7, Canada;2. Universidad Autónoma de Nuevo León, Facultad de Ingeniería Mecánica y Eléctrica, San Nicolás de los Garza 66450, Nuevo León, Mexico;3. Department of Physics, Kermanshah Branch, Islamic Azad University, Kermanshah, Iran;4. Laboratory of Thermal Processes, Research and Technology Center of Energy, Borj Cedria Science and Technology Park, 2050 Hammam-Lif, Tunisia;5. CEISAM, Universite de Nantes, CNRS, 2 rue de la Houssiniere, BP 32229, 44322 Nantes Cedex 3, France;6. University of Rennes 1, Institut d''Electronique et de Télécommunications, IETR - UMR CNRS 6164, Campus de Beaulieu –Bat 11D 263 Av General Leclerc, 35042 Rennes cedex, France;7. Institut des Materiaux Jean Rouxel (IMN), Universite de Nantes, CNRS, 2 rue de la Houssiniere, BP32229, 44322 Nantes Cedex 3, France;8. Reseau sur le Stockage Electrochimique de l''Energie (RS2E), FR CNRS, 3459, France |
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| Abstract: | Here we report on the synthesis of binary transition metal nitride electrodes based on titanium vanadium nitride (TiVN) thin films. These films were deposited by a method compatible with micro-electronic processes which consists of DC co-sputtering of vanadium (V) and titanium (Ti) targets. TiVN films with different Ti/V ratio were deposited. A dependence of the capacitance and the cycling stability with the Ti/V atomic ratio in the films was established. While V rich sample exhibits a Faradic behavior that limits its cycling ability despite a high areal and volumetric capacity, the addition of Ti in the film drastically improves the cycling ability with virtually no fade in capacitance after 10,000 cycles. Furthermore, a 1.1 Ti/V ratio leads to an areal capacitance up to 15 mF·cm− 2 in 1 M KOH electrolyte solution. Such electrodes shed light on the use of binary transition metal nitrides as candidate electrodes for micro-supercapacitor. |
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