Comparative surface and bulk analysis of oxygen in Si3N4 powders

Summary Five commercially available -Si₃N₄ powders and one in the modification were subjected to Auger electron spectroscopy (AES) and carrier-gas-heat extraction (CGHE) analysis.AES depth profiles of the oxygen/nitrogen ratio could be obtained, from which total oxygen contents were calculated and compared to CGHE data. It is demonstrated that by the latter method also dissolved oxygen in -Si₃N₄ is detected, whereas by AES only chemically bound oxygen can semiquantitatively be analyzed. Evidence is found for the existence of water, adsorbed or present as hydroxyl groups, near the surface.

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Vergleichende Oberflächen- und Bulkanalyse von Sauerstoff in Si₃N₄-Pulvern

List of Symbols A Surface area of an idealized Si₃N₄ grain - c _o ^AES Bulk concn. (by wt.) of oxygen in Si₃N₄ as estimated from AES depth profiles - C _O ^GHE Bulk concn. (by wt.) of oxygen in Si₃N₄ as obtained using CGHE in the fixed temperature mode - C _pr Bulk concn. (by wt.) of oxygen in Si₃N₄ as obtained using CGHE in the temperature programme mode - C_surf Bulk concn. (by wt.) of oxygen in Si₃N₄, tentatively assigned to superficial oxygen on Si₃N₄ particles, as obtained using CGHE in the temperature programme mode - C _U c _o ^AES as recalculated from X_U - d Diameter of an idealized Si₃N₄ grain (1 m) - M_index Formula mass of the species named in the index (O, 2 SiO₂, Si₃N₄) - m _o Mass of oxygen in the Si₃N₄ material - M_x Estimated formula mass of a (SiO₂)_2XSi₃N₄ compound as detected by AES via X - r Radius of an idealized Si₃N₄ grain (0.5 m) - V Volume of an idealized Si₃N₄ grain - X atomic oxygen-to-nitrogen ratio (AES) - X_a X values obtained in the scanning beam (area) mode - X_dec X values obtained in the fixed beam (point) mode after about 30 min measuring time (i.e., in some cases, severe decomposition) - X_p X values obtained in the fixed beam (point) mode within about 2 min measuring time (before severe decomposition) - X_U Background value for X in the AES depth profiles - xxps Atomic oxygen-to-nitrogen ratio as obtained from XPS data - Z Sputter depth - Z _E End value for the integration below the depth profile curves - _O Oxygen mass per unit area - _O Oxygen mass per unit volume (recalculated bulk concentration) - _U Oxygen mass per unit volume as recalculated from X_U.