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Stage iv work hardening of metals and semiconductors |
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| Authors: | P. Haasen |
| Affiliation: | (1) Institut für Metallphysik, Universität Göttingen, Hospitalstr. 3-5, FRG |
| Abstract: | The work hardening rate of metals in stage IV is analysed in the two-phase model of Nix et al. assuming dynamic recovery by cross slip but no climb which describes stage IV in semiconductors. |
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