雾化辅助化学气相沉积法氧化镓薄膜生长研究

采用自主设计搭建的雾化辅助化学气相沉积系统设备,开展了Ga₂O₃薄膜制备及其特性研究工作。通过X射线衍射研究了沉积温度、系统沉积压差对Ga₂O₃薄膜结晶质量的影响。结果表明,Ga₂O₃在425~650 ℃温度区间存在物相转换关系。随着沉积温度从425 ℃升高至650 ℃,薄膜结晶分别由非晶态、纯α-Ga₂O₃结晶状态向α-Ga₂O₃、β-Ga₂O₃两相混合结晶状态改变。通过原子力显微镜表征探究了生长温度对Ga₂O₃薄膜表面形貌的影响,从475 ℃升高至650 ℃时,薄膜表面粗糙度由26.8 nm下降至24.8 nm。同时,高分辨X射线衍射仪测试表明475 ℃、5 Pa压差条件下的α-Ga₂O₃薄膜样品半峰全宽仅为190.8″,为高度结晶态的单晶α-Ga₂O₃薄膜材料。

Gallium Oxide Thin Film Prepared by Atomization-Assisted Chemical Vapor Deposition

Based on the self-assembled equipment, the properties of Ga₂O₃ films prepared by atomization-assisted chemical vapor deposition (AA-CVD) method were studied. The effects of temperature and pressure difference on the crystal qualities of Ga₂O₃ thin films were studied by X-ray diffraction. The results show that there is a phase structure conversion process of Ga₂O₃, upon the temperature improving from 425 ℃ to 650 ℃, the crystalline structure of the thin films transform from amorphous structure, pure α-Ga₂O₃ crystal structure to α-Ga₂O₃, β-Ga₂O₃ two-phase mixed crystal structure. The effects of temperature on the thin films’ surface morphology were characterized by atomic force microscope. When the temperature increases from 475 ℃ to 650 ℃, the root-mean-square roughness of the thin films surface decrease from 26.8 nm to 24.8 nm. At the same time, the single crystal property of the α-Ga₂O₃ thin film was measured by high resolution X-ray diffraction. The result shows that the thin film sample having a full width at half maximum of only 190.8″ which prepared at the temperature of 475 ℃ and at the pressure difference of 5 Pa, it can prove that the α-Ga₂O₃ film is a highly crystallized single-crystal materia.