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8英寸导电型4H-SiC单晶衬底制备与表征
引用本文:娄艳芳,巩拓谌,张文,郭钰,彭同华,杨建,刘春俊. 8英寸导电型4H-SiC单晶衬底制备与表征[J]. 人工晶体学报, 2022, 51(12): 2131-2136
作者姓名:娄艳芳  巩拓谌  张文  郭钰  彭同华  杨建  刘春俊
作者单位:北京天科合达半导体股份有限公司,北京 102600
基金项目:国家重点研发计划(2021YFB3601100)
摘    要:使用物理气相传输法(PVT)通过扩径技术制备出直径为209 mm的4H-SiC单晶,并通过多线切割、研磨和抛光等一系列加工工艺制备出标准8英寸SiC单晶衬底。使用拉曼光谱仪、高分辨X射线衍射仪、光学显微镜、电阻仪、偏光应力仪、面型检测仪、位错检测仪等设备,对8英寸衬底的晶型、结晶质量、微管、电阻率、应力、面型、位错等进行了详细表征。拉曼光谱表明8英寸SiC衬底100%比例面积为单一4H晶型;衬底(004)面的5点X射线摇摆曲线半峰全宽分布在10.44″~11.52″;平均微管密度为0.04 cm-2;平均电阻率为0.020 3 Ω·cm。使用偏光应力仪对8英寸SiC衬底内部应力进行检测表明整片应力分布均匀,且未发现应力集中的区域;翘曲度(Warp)为17.318 μm,弯曲度(Bow)为-3.773 μm。全自动位错密度检测仪对高温熔融KOH刻蚀后的8英寸衬底进行全片扫描,平均总位错密度为3 293 cm-2,其中螺型位错(TSD)密度为81 cm-2,刃型位错(TED)密度为3 074 cm-2,基平面位错(BPD)密度为138 cm-2。结果表明8英寸导电型4H-SiC衬底质量优良,同比行业标准达到行业先进水平。

关 键 词:8英寸SiC单晶衬底  物理气相传输法  X射线摇摆曲线  微管密度  翘曲度和弯曲度  位错密度  
收稿时间:2022-12-05

Fabrication and Characterizations of 8-Inch n Type 4H-SiC Single Crystal Substrate
LOU Yanfang,GONG Tuochen,ZHANG Wen,GUO Yu,PENG Tonghua,YANG Jian,LIU Chunjun. Fabrication and Characterizations of 8-Inch n Type 4H-SiC Single Crystal Substrate[J]. Journal of Synthetic Crystals, 2022, 51(12): 2131-2136
Authors:LOU Yanfang  GONG Tuochen  ZHANG Wen  GUO Yu  PENG Tonghua  YANG Jian  LIU Chunjun
Affiliation:Beijing Tankeblue Semiconductor Co., Ltd., Beijing 102600, China
Abstract:A SiC single crystal boule with a diameter of 209 mm was grown by physical vapor transport (PVT) method with a diameter expansion technique. Standard 8-inch SiC single crystal substrates were fabricated by using the processes of multi-wire sawing, grinding, polishing and cleaning. Crystal polytype, crystal quality, micropipes, resistivity, stress, wafer shape, dislocation of a randomly selected 8-inch substrate were characterized by Raman spectrometer, high-resolution X-ray diffractometer, optical microscope, resistivity tester, polarization stress meter, wafer flatness tester, and dislocation detector. Raman spectra show that 8-inch substrate consists only 4H polytype. X-ray rocking curves illustrate full-width at half-maximum of the (004) peak between 10.44″ and 11.52″. Micropipe density is 0.04 cm-2 and the average resistivity is 0.020 3 Ω·cm. There is no stress concentration zone in the substrate with an evenly distributed stress. Warp and bow are 17.318 μm and -3.773 μm, respectively. The average dislocation density is 3 293 cm-2 by scanning the full area of the molten KOH etched 8-inch substrate, among which the density of threading screw dislocation(TSD), threading edge dislocation(TED) and basal plane dislocation(BPD) are 81 cm-2, 3 074 cm-2 and 138 cm-2, respectively. All results indicate the high quality of the 8-inch n type 4H-SiC substrate, which reaches world-class levels according to the comparsion with the industry standards.
Keywords:8-inch SiC single crystal substrate  physical vapor transport mehtod  X-ray rocking curve  micropipe density  warp and bow  dislocation density  
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