| 热处理对TbDyFe薄膜性能的影响 |
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| 引用本文： | 李晓明,杜兆富.热处理对TbDyFe薄膜性能的影响[J].物理实验,2012,32(5):9-13. |
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| 作者姓名： | 李晓明 杜兆富 |
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| 作者单位： | 1. 曲阜师范大学物理工程学院,山东曲阜,273165
2. 钢铁研究总院功能材料研究所,北京,100081 |
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| 摘 要： | 采用磁控溅射方法利用镶嵌靶材制备非晶TbDyFe薄膜,然后分别在150,300,450,550℃下退火,研究了热处理对TbDyFe薄膜性能的影响.结果显示,550℃温度下退火的样品出现RFe2相.随着退火温度的升高,晶粒逐渐长大,空洞网络变短而宽.薄膜的磁特性显示,其矫顽力及矩磁比均在出现RFe2相的550℃退火的样品中达到最大值.随着退火温度的增加,薄膜的易磁化轴从垂直膜面方向向平行膜面方向转动.
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| 关 键 词： | 磁致伸缩 TbDyFe薄膜 非晶 退火 |
TbDyFe thin films annealed at different temperature |
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| LI Xiao-ming
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DU Zhao-fu.TbDyFe thin films annealed at different temperature[J].Physics Experimentation,2012,32(5):9-13. |
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| Authors: | LI Xiao-ming DU Zhao-fu |
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| Institution: | 1.College of Physics and Engineering,Qufu Normal University,Qufu 273165,China; 2.Research Institute of Functional Materials,Central Iron & Steel Research Institute,Beijing 100081,China) |
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| Abstract: | The annealing behavior of TbDyFe thin films was investigated.Amorphous thin films were prepared by DC magnetron sputtering deposition from mosaic target.Annealing experiments were performed at 150,300,450 and 550 ℃.RFe2 phase was formed when samples were annealed at 550 ℃.Other phases observed were α-Fe,rare earth oxide and some unknown phases.During the annealing treatment,void networks were formed in the grain boundaries,i.e.,the film had a porous structure.The coercivity Hc and the ratio of remnant to saturation magnetization M/Ms increased strongly.Preferred in-plane anisotropy was observed at higher annealing temperature. |
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| Keywords: | magnetostriction TbDyFe films amorphous annealing |
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