Crack-free,thick rhodium deposition on copper substrate using Rhodex solution |
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| Authors: | M Sadeghi H Afarideh K Aardaneh M Kiyomarsi M Mirzaii |
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| Institution: | (1) Cyclotron Department, Nuclear Research Center for Agriculture and Medicine (NRCAM); Faculty of Physics, Amir-Kabir University, P.O. Box, 31585-4395, Karaj, Iran ; Tehran, Iran;(2) Faculty of Physics, Amir-Kabir University, Tehran, Iran;(3) Cyclotron Department, Nuclear Research Center for Agriculture and Medicine (NRCAM), P.O. Box, 31585-4395, Karaj, Iran;(4) Cyclotron Department, Nuclear Research Center for Agriculture and Medicine (NRCAM), P.O. Box, 31585-4395, Karaj, Iran;(5) Cyclotron Department, Nuclear Research Center for Agriculture and Medicine (NRCAM), P.O. Box, 31585-4395, Karaj, Iran |
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| Abstract: | Summary Rhodium electrodeposition on a copper substrate was investigated for 103Pd production. The electrodeposition was carried out by the commercially available Rhodex plating baths. The optimum conditions of the electrodeposition for complete depletion of Rh were: 6.2 g/l rhodium, DC current density of 12.83 mA . cm-2 and 60 °C temperature. |
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