Selective electroless metal deposition using microcontact printing of phosphine-phosphonic acid inks |
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Authors: | Carmichael Tricia Breen Vella Sarah J Afzali Ali |
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Institution: | IBM T. J. Watson Research Center, PO Box 218, Yorktown Heights, New York 10598, USA. tbcarmic@us.ibm.com |
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Abstract: | We report a low-cost approach to selectively deposit films of nickel and copper on glass substrates. Our approach uses microcontact printing of organic inks containing phosphonic acid groups to bind the ink to a glass substrate and phosphine groups to bind a colloidal catalyst that initiates electroless metallization. We demonstrate this procedure by fabricating patterned nickel and copper films with areas as large as 15 cm2 and minimum feature sizes of approximately 2 microm. We present studies on the use of two ink types, an oligomer and a bifunctional molecule, and demonstrate that pattern quality and adhesion of the metallized films depends on the molecular weight of the ink and the ratio of phosphine and phosphonic acid groups. |
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