Characterization of electrodeposited uranium films |
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Authors: | L. R. dos Santos M. E. Sbampato A. M. dos Santos |
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Affiliation: | 1. Institute for Advanced Studies, Airspace Technical Center, C. P. 6044, 12231-970, S?o José dos Campos, SP, Brazil
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Abstract: | Films containing uranium obtained by electrodeposition and used in alpha spectroscopic analysis were characterized by absorption spectroscopy, Raman spectroscopy, X-ray diffraction analysis and thermoanalysis. The electrodeposition method produced thin, adherent films with a yield near 100%. The analysis indicated that these films contained uranyl groups isolated or attached to other uranyl groups by oxygen bridges. Hydration water, hydroxyl groups linked by hydrogen bonds and ammonium radicals were also present. According to the X-ray diffraction analysis the films showed low crystallinity, characteristic to electrodeposited materials. The results of the thermogravimetric and differential thermal analysis did not correspond to any known pattern. This revised version was published online in July 2006 with corrections to the Cover Date. |
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