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Substitutional disorder effects on optical spectra of extremely heavily doped Si : P obtained by ion implantation and laser annealing
Authors:T. Motooka  T. Uda  M. Miyao
Affiliation:Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan
Abstract:The optical reflectivity spectrum (2500–5000 Å) of extremely heavily phosphorus (P)-doped Si has been studied. The E1 and E2 peaks, which represent the completeness of the Si crystal, are slightly affected when doping concentrations are less than 1021 cm-3 (2% Si : P). However,they appreciably degrade as the doping concentration increases from 1021 to 5×1021cm-3 (10% Si : P). As the result of band calculations using a supercell configuration and pseudopotential method, we have been able to ascribe this behavior to the substitutional disorder effect.
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