| COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS |
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| 作者姓名： | 方月娥 陈大鹏 刘刚 王冰 史天义 胡一贯 田扬超 阚娅 |
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| 作者单位： | Department of Applied Chemistry，University of Science and Technology of China，Hefei 230026，China，Department of Applied Chemistry，University of Science and Technology of China，Hefei 230026，China，Department of Applied Chemistry，University of Science and Technology of China，Hefei 230026，China，Department of Applied Chemistry，University of Science and Technology of China，Hefei 230026，China，Department of Applied Chemistry，University of Science and Technology of China，Hefei 230026，China，Hefei National Synchrotron Radiation Laboratory，University of Science and Technology of China，Hefei 230026，China，Hefei National Synchrotron Radiation Laboratory，University of Science and Technology of China，Hefei 230026，China，Hefei National Synchrotron Radiation Laboratory，University of Science and Technology of China，Hefei 230026，China |
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| 基金项目： | This work is financially supported by the National Natural Science Foundation of China. |
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| 摘 要： | The copolymers of chloroethyl methacrylate (CMA), glycidyl methacry-late (GMA), and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3, respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and0.17 ～0.2μm, respectively.
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| 收稿时间： | 1997-04-06 |
COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS* |
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| FANG Yuee,CHEN Dapeng,LIU Gang,WANG Bing,SHI Tianyi,HU Yiguan,TIAN Yangchao,KAN Ya.COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS[J].Chinese Journal of Polymer Science,1998,0(4):304-309. |
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| Authors: | FANG Yuee CHEN Dapeng LIU Gang WANG Bing SHI Tianyi HU Yiguan TIAN Yangchao KAN Ya |
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| Institution: | Department of Applied Chemistry; University of Science and Technology of China; Hefei 230026; China Hefei National Synchrotron Radiation Laboratory; University of Sciencc and Technology of China; China |
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| Abstract: | The copolymers of chloroethyl methacrylate (CMA), glycidyl methacry-late (GMA), and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3, respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and0.17 ～0.2μm, respectively. |
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| Keywords: | Copolymer X-ray Photoresists Submicron Resolution |
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