Investigation of structural and optical properties of UHV deposited titanium thin films under thermal oxidation

Titanium dioxide thin layers were prepared by annealing method, on glass substrate at different temperatures, 150, 250 and 350 °C, in presence of 5 cm³/s uniform oxygen flow. The structural investigations were performed by means of atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. Roughness of the films changed due to annealing process. The optical constants of the layers were obtained by Kramers–Kronig analysis of the reflectivity curves. There was a good agreement between structural and optical properties of the layers. Annealing temperature can play an important role in nanostructures of the films.