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Effect of substrate temperatures and annealing on optically detected magnetic resonance in glow-discharge amorphous silicon |
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| Authors: | K Morigaki BC Cavenett P Dawson S Nitta K Shimakawa |
| Institution: | Institute for Solid State Physics, University of Tokyo, Roppongi, Tokyo 106, Japan;Department of Physics, University of Hull, Hull, U.K.;Faculty of Engineering, Gifu University, Kakamihara, Gifu 504, Japan |
| Abstract: | Optically detected magnetic resonance experiments have been performed at 2 K in glow-discharge amorphous silicon with different substrate temperatures. Effects of annealing and illumination on ODMR have been examined. A broad line is interpreted in terms of a three-centre bond model. |
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