Thin polycrystalline films of W9Nb8O47−x As an electrochromic material |
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| Authors: | R.A. Lemons G.D. Boyd J.C. Phillips J.P. Remeika E.G. Spencer |
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| Affiliation: | Bell Telephone Laboratories, Holmdel, NJ 07733, U.S.A.;Bell Telephone Laboratories, Murray Hill, NJ 07974, U.S.A. |
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| Abstract: | Using r.f. sputtering and ion beam deposition techniques, thin polycrystalline films of W9Nb8O47?x have been prepared. X-ray diffraction measurements show these films have the same lattice spacings as bulk crystals which exhibit an elaborate tunnel structure. These films are electrochromic and have been evaluated for coloration and bleaching speed and for corrosion resistance. |
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