Pressure dependence of the metal-semiconductor transition in TaS3 |
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Authors: | M Ido K Tsutsumi T Sambongi N Môri |
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Institution: | Department of Physics, Hokkaido University, Sapporo 060, Japan |
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Abstract: | TaS3 exhibits the metal-semiconductor transition at 218 K due to the Peierls instability. The electrical resistance was measured under pressure. It was found that both the transition temperature, Tp, and the activation energy at T=0 K, △(0), decrease with pressure at the rates of and , respectively, while the ratio, , is independent of pressure. |
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