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Pressure dependence of the metal-semiconductor transition in TaS3
Authors:M Ido  K Tsutsumi  T Sambongi  N Môri
Institution:Department of Physics, Hokkaido University, Sapporo 060, Japan
Abstract:TaS3 exhibits the metal-semiconductor transition at 218 K due to the Peierls instability. The electrical resistance was measured under pressure. It was found that both the transition temperature, Tp, and the activation energy at T=0 K, △(0), decrease with pressure at the rates of dTpdP ?-1.3 Kkbar and d△(0)dP?-4 Kkbar, respectively, while the ratio, △ (0)Tp, is independent of pressure.
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