首页 | 本学科首页   官方微博 | 高级检索  
     

光学特异材料的设计(英文)
引用本文:Christian Helgert,Thomas Pertsch,Carsten Rockstuhl,Ekaterina Pshenay-Severin,Christoph Menzel,Ernst-Bernhard Kley,Arkadi Chipouline,Christoph Etrich,Uwe Huebner,Andreas Tuennermann,Falk Lederer. 光学特异材料的设计(英文)[J]. 中国光学与应用光学文摘, 2010, 0(1)
作者姓名:Christian Helgert  Thomas Pertsch  Carsten Rockstuhl  Ekaterina Pshenay-Severin  Christoph Menzel  Ernst-Bernhard Kley  Arkadi Chipouline  Christoph Etrich  Uwe Huebner  Andreas Tuennermann  Falk Lederer
作者单位:ultra-optics;Institute;Applied;Physics;Friedrich;Schiller;University;Jena;Condensed;Matter;Theory;Solid;State;Optics;Photonic;Technology(Albert-Einstein-Str.9;07745;Germany);Fraunhofer;Precision;Engineering;
摘    要:

关 键 词:材料  设计  光学  特异  

Tailoring the properties of optical metamaterials
Christian Helgert,Thomas Pertsch,Carsten Rockstuhl,Ekaterina Pshenay-Severin,Christoph Menzel,Ernst-Bernhard Kley,Arkadi Chipouline,Christoph Etrich,Uwe Huebner,,reas Tuennermann,Falk Lederer(.ZIK ultra-optics. Tailoring the properties of optical metamaterials[J]. Chinese Optics and Applied Optics Abstracts, 2010, 0(1)
Authors:Christian Helgert  Thomas Pertsch  Carsten Rockstuhl  Ekaterina Pshenay-Severin  Christoph Menzel  Ernst-Bernhard Kley  Arkadi Chipouline  Christoph Etrich  Uwe Huebner    reas Tuennermann  Falk Lederer(.ZIK ultra-optics
Affiliation:Christian Helgert1,Thomas Pertsch1,Carsten Rockstuhl2,Ekaterina Pshenay-Severin1,Christoph Menzel2,Ernst-Bernhard Kley1,Arkadi Chipouline1,Christoph Etrich2,Uwe Huebner3,,reas Tuennermann4,Falk Lederer2(1.ZIK ultra-optics,Institute of Applied Physics,Friedrich Schiller University Jena,Max-Wien-Platz 1,07743 Jena,Germany,2.Institute of Condensed Matter Theory , Solid State Optics,3.Institute of Photonic Technology,Alb...
Abstract:In this contribution we review our latest achievements of combined experimental and theoretical studies to tailor the properties of optical metamaterials(MMs) at will. We give three examples of metamaterial designs that have been realized by means of electron-beam lithography and whose spectroscopic characteristics have been comprehensively investigated. In every case, our experiments are complemented by rigorous numerical simulations. Particular emphasis is put on the significance of such tailored effectiv...
Keywords:optical metamaterials  lithography  negative-index  
本文献已被 CNKI 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号