Neutral and ion chemistry in a C2H4-SiH4 discharge |
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Authors: | Y. Catherine G. Turban B. Grolleau |
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Affiliation: | (1) Laboratoire de Physique Corpusculaire, E.R.A. C.N.R.S. 924, France;(2) Université de Nantes, 2, rue de la Houssinière, 44072 Nantes, Cedex, France |
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Abstract: | This paper reports on a mass spectrometric study of the neutral and ionic species in a low-pressure rf discharge sustained in a C2H4-SiH4 mixture diluted in helium. It is shown that C2H4 is readily decomposed into C2H2* and C2H3. The formation of secondary products such as C4H2, C4H4, and C4H6 is observed and confirms the presence of C2H2 in the discharge. Methylsilane (CH3SiH3) and ethylsilane (C2H5SiH3) are also synthesized in this discharge. It is also observed that the major ions C2H4+, C3H5+, SiH3+, Si2H4+, SiCH3+, SiC2H3+, and SiC2H7+ are not representative of the direct ionization of neutral species. Their formation is thus interpreted on the basis of ion-molecule reactions. |
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Keywords: | Plasma mass spectrometry electron impact dissociation radical reactions ion-molecule reactions |
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