Electron spectroscopy measurements on hydrogen implanted graphite and comparison to amorphous hydrogenated carbon films (a-C:H) |
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Authors: | D Ugolini J Eitle P Oelhafen |
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Institution: | (1) Institut für Physik der Universität Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland |
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Abstract: | Highly oriented pyrolytic graphite (HOPG) as well as polycrystalline graphite (pc-graphite) were bombarded with 3.5 keV H+ ions by means of a Penning ion source. The implanted graphite was characterized by in situ electron spectroscopy techniques such as UPS, XPS and EELS. Our UPS valence band measurements of the hydrogen saturated graphite reveal it to be an insulating phase, and XPS measurements show a shift of the C1s core level to higher binding energy with respect to pristine graphite. This behavior is explained by a Fermi energy shift upon hydrogen bombardment of graphite.In addition, a close resemblance in the electronic structure of hydrogen bombarded graphite and amorphous hydrogenated carbon films (a-C:H) is shown which suggests the modification of pristine graphite to an amorphous network 1] of mostly tetrahedrally bonded carbon atoms by hydrogen implantation. |
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Keywords: | 79 20-m 79 60-i 73 60-n |
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