| 立方氮化硼薄膜的气相沉积及过渡层对其附着性能的影响 |
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| 引用本文： | 贺琦,潘俊德,徐重.立方氮化硼薄膜的气相沉积及过渡层对其附着性能的影响[J].人工晶体学报,2005,34(2):364-368. |
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| 作者姓名： | 贺琦 潘俊德 徐重 |
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| 作者单位： | 太原理工大学表面工程研究所,太原,030024;Materials Research Institute,Pennsylvania State University,16802 PA,USA;太原理工大学表面工程研究所,太原,030024;Materials Research Institute,Pennsylvania State University,16802 PA,USA |
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| 摘 要： | 本文采用非平衡磁控溅射物理气相沉积工艺，在单晶硅基片上合成了立方氮化硼薄膜，并且通过采用过渡层提高了立方氮化硼薄膜的附着力，过渡层分别是碳化硼(B4C)薄膜以及碳化硼(B4C)薄膜与B-C—N梯度层的复合层(B4C／B—C—N)。同时，不同过渡层的存在使立方氮化硼薄膜的剥落机理产生变化。
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| 关 键 词： | 薄膜 立方氮化硼 非平衡磁控溅射 过渡层 附着力 |
| 文章编号： | 1000-985X(2005)02-0364-05 |
Vapor Phase Deposition of Cubic Boron Nitride(cBN) Thin Films and Improvement of Its Adhesion by Interlayers |
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| HE Qi,PAN Jun-de,XU Zhong,Russell F.Messier.Vapor Phase Deposition of Cubic Boron Nitride(cBN) Thin Films and Improvement of Its Adhesion by Interlayers[J].Journal of Synthetic Crystals,2005,34(2):364-368. |
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| Authors: | HE Qi PAN Jun-de XU Zhong Russell FMessier |
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| Abstract: | By using unbalanced magnetron sputtering system, cubic boron nitride (cBN) thin films were deposited on c-Si with B_4C interlayers and B-C-N gradient layer on top of the B_4C interlayer, separately. Interlayers are very helpful for improving the adhesion of cBN on silicon and have much effect on the delamination mechanism of BN thin films. |
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| Keywords: | thin films cubic boron nitride unbalanced magnetron sputtering interlayer adhesion |
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