| Abstract: | Copolymers of styrene and 4‐vinylpyridine with a styrene fraction f varying from 1 to 0 were grafted onto a silicon substrate in the melt. The grafting reaction and the stability of the grafted chains were investigated by Fourier transform infrared and X‐ray photoelectron spectroscopy. The thickness and surface morphology of the grafted copolymer layers were characterized with ellipsometry and atomic force microscopy (AFM). The copolymer chains were successfully grafted to the surface of the silicon substrate by a reaction between the hydroxyl groups of the nitroxide moiety at the end of the copolymers and the silanol groups on the surface of the silicon wafer. A measurement of the thickness of the grafted copolymer layers showed that the ratio of grafted‐layer thickness to the unperturbed chain radius of gyration decreased with the increasing fraction of 4‐vinylpyridine in the copolymer; this indicated that the grafted layer was strongly attracted to the substrate. In addition, an accelerated grafting process was observed at grafting times ranging from 48 to 72 h for pure poly(4‐vinylpyridine) and copolymers with f values of 0.3 and 0.5. AFM observation revealed that the grafted layers densely and homogeneously covered the silicon substrate. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 1332‐1343, 2005 |
