Interaction of iron atoms with the Si(100)-2 × 1 surface |
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| Authors: | M V Gomoyunova I I Pronin D E Malygin S M Solov’ev D V Vyalykh S L Molodtsov |
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| Institution: | 1.Ioffe Physicotechnical Institute,Russian Academy of Sciences,St. Petersburg,Russia;2.Institut für Oberfl?chen-und Mikrosructurphysik,Technische Universit?t Dresden,Dresden,Germany |
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| Abstract: | Interaction of iron atoms with the Si(100)-2 × 1 surface at room temperature is studied by core-level photoelectron spectroscopy
using synchrotron radiation for Fe coverages ranging from a fraction of a monolayer to six monolayers. It is shown that the
Fe/Si(100)-2 × 1 interface is chemically active: the Fe-Si solid solution forms early in deposition of iron on silicon. When
the Fe coverage reaches four to five monolayers, the state of the system is changed and Fe3Si silicide arises. |
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