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Outgassing analysis of molecular glass photoresists under EUV irradiation |
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| Authors: | CHEN Li XU Jian YUAN Hua YANG Shu Min WANG Lian Sheng WU Yan Qing ZHAO Jun CHEN Ming LIU Hai Gang LI Sha Yu TAI Ren Zhong WANG Shuang Qing YANG Guo Qiang |
| Abstract: | A device was designed and assembled to analyze the outgassing of molecular glass(MG)photoresists under extreme ultraviolet(EUV)exposure.The outgassing of the photoresists with different components and different concentrations of tert-butoxycarbonyl(t-Boc),photo-generated acid(PAG),and acid quencher was systematically investigated.Based on experiments,some solutions for reducing the outgassing of MG photoresists were proposed. |
| Keywords: | photoresist EUV lithography molecular glass outgassing |
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